Antimicrobial metal-based nanoparticles: a review on their synthesis, types and antimicrobial action

• Matías Guerrero Correa,
• Fernanda B. Martínez,
• Cristian Patiño Vidal,
• Camilo Streitt,
• Juan Escrig and
• Carol Lopez de Dicastillo

Beilstein J. Nanotechnol. 2020, 11, 1450–1469, doi:10.3762/bjnano.11.129

• particle sizes, are listed in Table 2. The atomic layer deposition method is employed to grow metal oxide and metallic three-dimensional nanostructures using porous alumina membranes [41], electrostatically spun nanofibers [39][40] or electrosprayed spherical particles [38] as templates. As Figure 1 shows

3D superconducting hollow nanowires with tailored diameters grown by focused He⁺ beam direct writing

• Rosa Córdoba,
• Alfonso Ibarra,
• Dominique Mailly,
• Isabel Guillamón,
• Hermann Suderow and
• José María De Teresa

Beilstein J. Nanotechnol. 2020, 11, 1198–1206, doi:10.3762/bjnano.11.104

• . Helium ion microscopy in combination with a precursor gas can be used for direct writing of three-dimensional nanostructures with a precise control of their geometry, and a significantly higher aspect ratio than other additive manufacturing technologies. We report here on the deposition of 3D hollow

Biomimetic synthesis of Ag-coated glasswing butterfly arrays as ultra-sensitive SERS substrates for efficient trace detection of pesticides

• Guochao Shi,
• Mingli Wang,
• Yanying Zhu,
• Yuhong Wang,
• Xiaoya Yan,
• Xin Sun,
• Haijun Xu and
• Wanli Ma

Beilstein J. Nanotechnol. 2019, 10, 578–588, doi:10.3762/bjnano.10.59

• and homogeneous plasmonic nanostructures. These physical methods, unfortunately, are limited by their high cost and time-consuming experimental processes. By using chemical methods (“bottom-up” techniques), Au or Ag nanoparticles were prepared to develop two- and three-dimensional nanostructures

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• different precursors are presented that validate the effectiveness of the implementation. Keywords: focused electron beam induced deposition; nanofabrication; three-dimensional nanostructures; 1 Introduction New physical effects and functionalities can arise when the third dimension can be accessed at the

Hierarchical heterostructures of Bi₂MoO₆ microflowers decorated with Ag₂CO₃ nanoparticles for efficient visible-light-driven photocatalytic removal of toxic pollutants

• Shijie Li,
• Wei Jiang,
• Shiwei Hu,
• Yu Liu,
• Yanping Liu,
• Kaibing Xu and
• Jianshe Liu

Beilstein J. Nanotechnol. 2018, 9, 2297–2305, doi:10.3762/bjnano.9.214

• ] Ag2CO3/AgBr/ZnO [42], and Ag/Ag2CO3/Bi2MoO6 [32]. The band structure of Ag2CO3 matches well with that of Bi2MoO6 [32]. Moreover, morphology modulation is another significant way to enhance photocatalytic activity. Three-dimensional nanostructures endow materials with unique physicochemical properties

Phosphorus monolayer doping (MLD) of silicon on insulator (SOI) substrates

• Noel Kennedy,
• Ray Duffy,
• Luke Eaton,
• Dan O’Connell,
• Scott Monaghan,
• Shane Garvey,
• James Connolly,
• Chris Hatem,
• Justin D. Holmes and
• Brenda Long

Beilstein J. Nanotechnol. 2018, 9, 2106–2113, doi:10.3762/bjnano.9.199

• conformally dope three-dimensional nanostructures due to the directionality of the technique. Ion implantation operators have devised several methods to counter these issues such as hot implantations but have shown only moderate success [3][4]. The introduction of crystal damage has major consequences when

Sheet-on-belt branched TiO₂(B)/rGO powders with enhanced photocatalytic activity

• Huan Xing,
• Wei Wen and
• Jin-Ming Wu

Beilstein J. Nanotechnol. 2018, 9, 1550–1557, doi:10.3762/bjnano.9.146

• TiO2(B) is usually adopted to construct phase junctions with anatase TiO2 for applications in photocatalysis to facilitate charge separation; its intrinsic photocatalytic activity, especially when in the form of one- or three-dimensional nanostructures, has been rarely reported. In this study, a sheet

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• towards the direct electron beam writing of three-dimensional plasmonic device parts from the gas phase. Keywords: carboxylate; electron beam induced deposition; silver; three-dimensional nanostructures; vertical growth rate; Introduction Focused electron beam induced deposition (FEBID) is a resistless

• direct-write technique that allows for a highly precise fabrication of three-dimensional nanostructures [1][2]. Gaseous precursor molecules are injected into the vacuum chamber of a scanning electron microscope and are locally dissociated by a focused electron beam [3]. After dissociation, the non

• continuous spot irradiations using AgO2F5Prop and different beam currents over several hours. Truly three-dimensional nanostructures with high aspect ratios could be achieved. They exhibit different diameters from around 1 µm for 50 pA to 1.5 µm for 150 pA and almost 2.5 µm for 500 pA. The pillar widths

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• ; focused electron beam induced deposition; heteronuclear FEBID precursors; surface science; Introduction Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• electron beam irradiation, with non-volatile product species being incorporated into the growing deposit. The size and shape of the nanostructure are controlled by manipulation of the electron beam (focusing ability and patterning capabilities), which allows an almost unlimited array of three-dimensional

• nanostructures to be fabricated. Despite the significant advantages of a process that can direct write nanostructures without the need for resists or masks [2][3], FEBID has several challenges preventing its wider implementation as a robust method for nanofabrication. One of the biggest issues is deposit purity

Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• does not require masks or templates, it can achieve sub-10 nm spatial resolution [4][5], and it has the unique ability to fabricate complex three-dimensional nanostructures [6][7][8][9]. Recent key progress on FEBID includes the growth of pure metallic nanostructures by mixing precursor and reactive